Copper Electrochemical Deposition in Macroporous Silicon Arrays for Through Silicon Via Applications

Defforge, Thomas, Coudron, Loic, Gautier, Gael, Grimal, Virginie, Ventura, Laurent and Tran Van, Francois (2011) Copper Electrochemical Deposition in Macroporous Silicon Arrays for Through Silicon Via Applications. Institute of Electrical and Electronics Engineers (IEEE).
Copy

The present paper deals with the realization of high conductivity through silicon via from macroporous silicon arrays. The pores were first etched by anodization into a hydrofluoric acid mixture. The high aspect ratio via were then filled by an optimized potentiostatic way involving a specific electrolyte with additives. The copper micro-wires were observed by SEM whereas XRD analysis enabled the determination of copper average grain size.

Full text not available from this repository.

Atom BibTeX OpenURL ContextObject in Span OpenURL ContextObject Dublin Core MPEG-21 DIDL Data Cite XML EndNote HTML Citation METS MODS RIOXX2 XML Reference Manager Refer ASCII Citation
Export

Downloads